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Filter aids semiconductor etch processing


Book ID
114311587
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
96 KB
Volume
2005
Category
Article
ISSN
0958-2118

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Modelling and control of plasma etching
โœ H. Meng; P.C. Russell; P.J.G. Lisboa; G.R. Jones ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 294 KB

Al?~ract --Despite its widespread use, plasma etching remains a poorly understood operation. Using chromatic monitor to measure key plasma parameters, the etch process was characterised using response surface methodology. In order to develop control-oriented models, open-loop dynamic testing was car