𝔖 Bobbio Scriptorium
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Modeling of etching process via kalman filter and channel length control

✍ Scribed by Ikuo Matsuba; Kuniaki Matsumoto; Kazunari Kobayashi


Book ID
112076077
Publisher
John Wiley and Sons
Year
1985
Tongue
English
Weight
594 KB
Volume
68
Category
Article
ISSN
8756-663X

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Modelling and control of plasma etching
✍ H. Meng; P.C. Russell; P.J.G. Lisboa; G.R. Jones πŸ“‚ Article πŸ“… 1999 πŸ› Elsevier Science 🌐 English βš– 294 KB

Al?~ract --Despite its widespread use, plasma etching remains a poorly understood operation. Using chromatic monitor to measure key plasma parameters, the etch process was characterised using response surface methodology. In order to develop control-oriented models, open-loop dynamic testing was car