Al?~ract --Despite its widespread use, plasma etching remains a poorly understood operation. Using chromatic monitor to measure key plasma parameters, the etch process was characterised using response surface methodology. In order to develop control-oriented models, open-loop dynamic testing was car
โฆ LIBER โฆ
Modeling and control of a semiconductor manufacturing process with an automata network: An example in plasma etch processing
โ Scribed by Edward A. Rietman; Suresh H. Patel; Earl R. Lory
- Book ID
- 107950973
- Publisher
- Elsevier Science
- Year
- 1996
- Tongue
- English
- Weight
- 853 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0305-0548
No coin nor oath required. For personal study only.
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