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Application of plasma etching techniques to metal-oxide-semiconductor (MOS) processing

✍ Scribed by R.C. Booth; C.J. Heslop

Book ID: 107862729
Publisher: Elsevier Science
Year: 1980
Tongue: English
Weight: 838 KB
Volume: 65
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(80)90063-2

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