✦ LIBER ✦
Nanoscale Selective Plasma Etching of Ultrathin HfO 2 Layers on GaAs for Advanced Complementary Metal–Oxide–Semiconductor Devices
✍ Scribed by Anguita, Jose; Benedicto, Marcos; Alvaro, Raquel; Galiana, Beatriz; Tejedor, Paloma
- Book ID
- 120944687
- Publisher
- Institute of Pure and Applied Physics
- Year
- 2010
- Tongue
- English
- Weight
- 190 KB
- Volume
- 49
- Category
- Article
- ISSN
- 0021-4922
No coin nor oath required. For personal study only.