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Film-thickness dependence of structural and electrical properties of boron-doped hydrogenated microcrystalline silicon prepared by radiofrequency magnetron sputtering

✍ Scribed by Akimori Tabata; Junya Nakano; Koji Mazaki; Kota Fukaya

Book ID: 116672194
Publisher: Elsevier Science
Year: 2010
Tongue: English
Weight: 510 KB
Volume: 356
Category: Article
ISSN: 0022-3093
DOI: 10.1016/j.jnoncrysol.2010.04.011

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