Fabrication of p-Type Li-Doped ZnO Films by RF Magnetron Sputtering
β Scribed by Kuo-Chuang Chiu; Yi-Wen Kao; Jau-Ho Jean
- Book ID
- 109262900
- Publisher
- John Wiley and Sons
- Year
- 2010
- Tongue
- English
- Weight
- 232 KB
- Volume
- 93
- Category
- Article
- ISSN
- 0002-7820
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π SIMILAR VOLUMES
Arsenic doped p-type ZnO thin films were grown on sapphire substrate by magnetron sputtering. As grown films reveal p-type conduction confirmed by Hall-effect and photoluminescence measurements. The p-type film with a hole concentration of 2.16Γ 10 17 cm -3 , mobility of 1.30 cm 2 /V.s and resistivi
p-Type aluminum-nitrogen (Al-N) co-doped zinc oxide (ZnO) thin films were deposited on glass substrate at 300 1C by RF reactive magnetron sputtering using an aluminum-doped zinc oxide (2.4 wt%Al 2 O 3 ) target and N 2 reactive gas. In addition, the effect of N 2 reactive gas on the electrical and st