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Fabrication of oxidation-resistant β-FeSi2 film on Mg2Si by RF magnetron-sputtering deposition

✍ Scribed by Jun-ichi Tani; Masanari Takahashi; Hiroyasu Kido

Book ID
116605561
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
362 KB
Volume
488
Category
Article
ISSN
0925-8388

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Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore