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Structural and electrical properties of Co-doped β-FeSi2 thin films prepared by RF magnetron sputtering

✍ Scribed by M. Sawada; H. Katsumata; Y. Tomokuni; S. Uekusa


Book ID
118492417
Publisher
Elsevier
Year
2012
Tongue
English
Weight
321 KB
Volume
23
Category
Article
ISSN
1875-3892

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Thin films of ZrO 2 were prepared by reactive magnetron sputtering. Annealing of the films exhibited a drastic change in the properties due to improved crystallinity and packing density. The root mean square roughness of the sample observed from atomic force microscope is about 5.75 nm which is comp