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Fabrication of microstructures for quantum devices using focused ion beam gas-assisted etching

โœ Scribed by Y. Ochiai; R.J. Young; J.R.A. Cleaver; H. Ahmed; T. Baba


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
279 KB
Volume
13
Category
Article
ISSN
0167-9317

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Fabrication of high-aspect-ratio submicr
โœ Shizhuo Yin ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 150 KB ๐Ÿ‘ 2 views

The fabrication of high-aspect-ratio submicron-to-nanometer range microstructures in LiNbO using a state-of-the-art Schlum-3 ( ) berger AMS 3000 focused ion-beam FIB system is presented. The submicron structures with about 350 nm width and 1600 nm depth are fabricated by employing XeF gas-assisted g