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Fabrication of fully self-aligned joint-gate CMOS structures

โœ Scribed by Robinson, A.L.; Antoniadis, D.A.; Maby, E.W.


Book ID
114595183
Publisher
IEEE
Year
1985
Tongue
English
Weight
507 KB
Volume
32
Category
Article
ISSN
0018-9383

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## Abstract In this paper we report a new approach to fabricate gated silicon microtip arrays for field emission applications using a single mask process. The key role in the fabrication process is played by the photoelectrochemical etching of silicon in HFโ€based electrolytes. This technique is her