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Fabrication of self-aligned gated silicon microtip array using electrochemical silicon etching

✍ Scribed by Barillaro, G. ;D'Angelo, F. ;Pennelli, G. ;Pieri, F.

Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
163 KB
Volume
202
Category
Article
ISSN
0031-8965

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✦ Synopsis

Abstract

In this paper we report a new approach to fabricate gated silicon microtip arrays for field emission applications using a single mask process. The key role in the fabrication process is played by the photoelectrochemical etching of silicon in HF‐based electrolytes. This technique is here exploited to produce highly uniform silicon microtip arrays. The fabrication process is detailed and the dependence of the tip geometry on the electrochemical etching parameters is discussed. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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