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Fabrication of ferromagnetic nanoconstrictions by electron beam lithography using LOR/PMMA bilayer technique

✍ Scribed by Yifang Chen; Zhengqi Lu; Xudi Wang; Zheng Cui; Genhua Pan; Yun Zhou; M. Muñoz; Cheng Hao; Lu Yonghua; N. Garcia

No coin nor oath required. For personal study only.

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