Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

✍ Scribed by Yusuke Tanabe; Hiroyuki Nishikawa; Yoshihiro Seki; Takahiro Satoh; Yasuyuki Ishii; Tomihiro Kamiya; Tohru Watanabe; Atsushi Sekiguchi

• Publisher: Elsevier Science
• Year: 2011
• Tongue: English
• Weight: 781 KB
• Volume: 88
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2011.01.019