Fabrication of a Low-Loss SSC Using High-Dose Electron Beam Lithography Exposure With Negative PMMA Resist

✍ Scribed by Yan Liu; Xuejun Xu; Bo Xing; Yude Yu; Jinzhong Yu

• Book ID: 119805463
• Publisher: IEEE
• Year: 2010
• Tongue: English
• Weight: 409 KB
• Volume: 22
• Category: Article
• ISSN: 1041-1135
• DOI: 10.1109/lpt.2010.2040998