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Fabrication of diamond in-plane-gated field effect transistors using oxygen plasma etching

✍ Scribed by Banno, Tokishige; Tachiki, Minoru; Nakazawa, Kazushi; Sumikawa, Yu; Umezawa, Hitoshi; Kawarada, Hiroshi

Book ID: 123101264
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 630 KB
Volume: 12
Category: Article
ISSN: 0925-9635
DOI: 10.1016/S0925-9635(03)00039-6

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