Fabrication and characterisation of transparent-gate field effect transistors using indium tin oxide
β Scribed by Khalid, A.H.; Rezazadeh, A.A.
- Book ID
- 114455578
- Publisher
- The Institution of Electrical Engineers
- Year
- 1996
- Tongue
- English
- Weight
- 618 KB
- Volume
- 143
- Category
- Article
- ISSN
- 1350-2433
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## Abstract Indium tin oxide (ITO) thin films can be manufactured by spincoating or inkjet printing of a solution containing indium and tin oximato precursor complexes. After sintering at 600βΒ°C and annealing in reducing atmosphere, resistivities as low as 2.34βΓβ10^β3^βΞ©βcm were observed, with a t
The characteristics of solution processed top-gate-type organic field-effect transistors (OFETs) with indium-tin oxide (ITO) drain/source electrodes using polyfluorene derivatives were investigated. An OFET with poly(9,9-dioctylfluorene) (F8) as an active layer, which contains only a fluorene backbo