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Fabrication of a-Si: H films by microwave plasmas under electron cyclotron resonance conditions

✍ Scribed by S.R. Mejia; R.D. McLeod; W. Fries; P. Shufflebotham; D.J. Thomson; J. White; J. Shellenberg; K.C. Kao; H.C. Card

No coin nor oath required. For personal study only.

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