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Characteristics of a-Si:H films deposited by electron cyclotron resonance plasma CVD

✍ Scribed by Masahiro Hayama; Kazuhiro Kobayashi; Satoru Kawamoto; Hidejiro Miki; Yoichiro Onishi

Book ID: 115985921
Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 154 KB
Volume: 97-98
Category: Article
ISSN: 0022-3093
DOI: 10.1016/0022-3093(87)90065-2

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