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Silicon dioxide films fabricated by electron cyclotron resonant microwave plasmas

✍ Scribed by Chau, T.T.; Herak, T.V.; Thomson, D.J.; Mejia, S.R.; Buchanan, D.A.; McLeod, R.D.; Kao, K.C.

Book ID: 114533359
Publisher: IEEE
Year: 1990
Tongue: English
Weight: 529 KB
Volume: 25
Category: Article
ISSN: 0018-9367
DOI: 10.1109/14.55737

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