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Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography

✍ Scribed by M. D. Austin; H. Ge; W. Wu; M. Li; Z. Yu; D. Wasserman; S. A. Lyon; S. Y. Chou

Book ID: 126680643
Publisher: American Institute of Physics
Year: 2004
Tongue: English
Weight: 720 KB
Volume: 84
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.1766071

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