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Fabrication of sub-50 nm Au nanowires using thermally curing nanoimprint lithography

✍ Scribed by Sung-Hoon Hong; Byeong-Ju Bae; Ki-Yeon Yang; Jun-Ho Jeong; Hyeong-Seok Kim; Heon Lee


Book ID
111857041
Publisher
The Korean Institute of Metals and Materials
Year
2009
Tongue
English
Weight
612 KB
Volume
5
Category
Article
ISSN
1738-8090

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We report the fabrication of 6-nm Au-Pd structures using 30-keV e-beam lithography in a standard double-layer poly(methylmethacrylate) resist on silicon and subsequent lift-off. Line arrays with periods as small as 27 nm were realized. Details of the processing are presented and the dependence of th