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Fabrication and properties of A1N film on GaN substrate by using remote plasma atomic layer deposition method

✍ Scribed by Kwang-Ho Kim; No-Won Kwak; Soo Hong Lee

Book ID: 111857031
Publisher: The Korean Institute of Metals and Materials
Year: 2009
Tongue: English
Weight: 292 KB
Volume: 5
Category: Article
ISSN: 1738-8090
DOI: 10.3365/eml.2009.06.083

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