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Self-limiting growth of ZnO films on (0 0 0 1) sapphire substrates by atomic layer deposition at low temperatures using diethyl-zinc and nitrous oxide

✍ Scribed by Yen-Ting Lin; Ping-Han Chung; Hung-Wei Lai; Hsin-Lun Su; Dong-Yuan Lyu; Kuo-Yi Yen; Tai-Yuan Lin; Chung-Yuan Kung; Jyh-Rong Gong


Book ID
108064136
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
338 KB
Volume
256
Category
Article
ISSN
0169-4332

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The atomic-layer epitaxy of rutile thin films on sapphire (0 0 1) substrates was studied in the controlled growth of titanium oxide films by sequential surface chemical reactions using sequentially fast pressurized titanium tetrachloride (TiCl 4 ) and water (H 2 O) vapor pulses. Optical constants an