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Extended defect formation and the flux of interstitials in Si-ion implanted silicon

✍ Scribed by T.W. Simpson; I.V. Mitchell

Book ID: 114168737
Publisher: Elsevier Science
Year: 1997
Tongue: English
Weight: 441 KB
Volume: 127-128
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(96)00858-0

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