✦ LIBER ✦

Exploring the high sensitivity of SU-8 resist for high resolution electron beam patterning

✍ Scribed by A. Pépin; V. Studer; D. Decanini; Y. Chen

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

High voltage electron beam lithography o

✍ A. Claβen; S. Kuhn; J. Straka; A. Forchel 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 299 KB

High-resolution electron beam lithograph

✍ W. Zhang; A. Potts; D.M. Bagnall; B.R. Davidson 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 594 KB

Crosslinked PMMA as a high-resolution ne

✍ Zailer, I; Frost, J E F; Chabasseur-Molyneux, V; Ford, C J B; Pepper, M 📂 Article 📅 1996 🏛 Institute of Physics 🌐 English ⚖ 238 KB

Modeling of electron beam scattering in

✍ Gentili, M. ;Lucchesini, A. ;Scopa, L. ;Lugli, P. ;Paoletti, A. ;Messina, G. ;Sa 📂 Article 📅 1990 🏛 John Wiley and Sons 🌐 English ⚖ 647 KB

Improvement in high resolution image qua

✍ Kenneth H. Downing; Robert M. Glaeser 📂 Article 📅 1986 🏛 Elsevier Science 🌐 English ⚖ 871 KB

Optimisation of electron-beam surface ha

✍ Jean Ming-der; Tzeng Yih-fong 📂 Article 📅 2004 🏛 Springer 🌐 English ⚖ 565 KB