๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Etching characteristics of LiNbO 3 crystal by fluorine gas plasma reactive ion etching

โœ Scribed by Tamura, Masashi; Yoshikado, Shinzo

Book ID
122248604
Publisher
Institute of Physics and National Institute of Materials Science
Year
2001
Tongue
English
Weight
634 KB
Volume
2
Category
Article
ISSN
1468-6996

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Reactive ion beam etching characteristic
Reactive ion beam etching characteristics of LiNbO3
โœ Ren Congxin; Yang Jie; Zheng Yanfang; Chen Lizhi; Chen Guoliang; Tsou Shichang ๐Ÿ“‚ Article ๐Ÿ“… 1987 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 962 KB
Asymmetry ridge structure fabrication an
Asymmetry ridge structure fabrication and reactive ion etching of LiNbO3
โœ W.S. Yang; H.-Y. Lee; W.K. Kim; D.H. Yoon ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 299 KB

Ti-indiffused LiNbO 3 waveguides have been used for various high speed optical devices, such as modulators, switches and sensors, because of their electro-optic effect. In order to broaden the modulation bandwidth of an optical modulator above 10 GHz, both impedance matching and optical and RF phase