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Etch characteristics of MgO thin films in Cl2/Ar, CH3OH/Ar and CH4/Ar plasmas

✍ Scribed by Lee, Il Hoon; Lee, Tea Young; Hwang, Su Min; Chung, Chee Won

Book ID: 122573221
Publisher: Elsevier Science
Year: 2014
Tongue: English
Weight: 865 KB
Volume: 101
Category: Article
ISSN: 0042-207X
DOI: 10.1016/j.vacuum.2013.10.012

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