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Etch characteristics of HfO2 films on Si substrates

✍ Scribed by S. Norasetthekul; P.Y. Park; K.H. Baik; K.P. Lee; J.H. Shin; B.S. Jeong; V. Shishodia; D.P. Norton; S.J. Pearton

No coin nor oath required. For personal study only.

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