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Electrical properties of high-k HfO2 films on Si1−xGex substrates

✍ Scribed by Tae Joo Park; Seong Keun Kim; Jeong Hwan Kim; Jaehoo Park; Moonju Cho; Suk Woo Lee; Sug Hun Hong; Cheol Seong Hwang

No coin nor oath required. For personal study only.

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