๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Plasma etching of SnO2 films on silicon substrates

โœ Scribed by E.S Braga; A.P Mammana; C.I.Z Mammana; Richard L Anderson


Book ID
107862856
Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
173 KB
Volume
73
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Wet etching of thin SnO2 films
โœ V.K. Gueorguiev; L.I. Popova; G.D. Beshkov; N.A. Tomajova ๐Ÿ“‚ Article ๐Ÿ“… 1990 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 220 KB
Etch characteristics of HfO2 films on Si
โœ S. Norasetthekul; P.Y. Park; K.H. Baik; K.P. Lee; J.H. Shin; B.S. Jeong; V. Shis ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 322 KB
Sol-gel TiO2 films on silicon substrates
โœ K.A. Vorotilov; E.V. Orlova; V.I. Petrovsky ๐Ÿ“‚ Article ๐Ÿ“… 1992 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 394 KB
Isotropic Plasma Etching of SiO2 Films
โœ A. A. Kovalevskii; V. S. Malyshev; V. V. Tsybul'skii; V. M. Sorokin ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› Springer ๐ŸŒ English โš– 89 KB
Effects of plasma etching on DLC films
โœ M. Massi; R.D. Mansano; H.S. Maciel; C. Otani; P. Verdonck; L.N.B.M. Nishioka ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 351 KB