Equivalent oxide thickness scaling of Al 2 O 3 /Ge metal—oxide—semiconductor capacitors with ozone post oxidation

✍ Scribed by Sun, Jia-Bao; Yang, Zhou-Wei; Geng, Yang; Lu, Hong-Liang; Wu, Wang-Ran; Ye, Xiang-Dong; David, Zhang Wei; Shi, Yi; Zhao, Yi

• Book ID: 120687377
• Publisher: IOP Publishing
• Year: 2013
• Tongue: English
• Weight: 402 KB
• Volume: 22
• Category: Article
• ISSN: 1674-1056
• DOI: 10.1088/1674-1056/22/6/067701