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Epitaxial regrowth and lattice location of indium implanted in arsenic-preamorphized silicon

✍ Scribed by E. Alves; M.F. Da Silva; J.C. Soares; A.A. Melo; J. May; V. Haslar; P. Seidl; U. Feuser; R. Vianden

No coin nor oath required. For personal study only.

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