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Lattice location and dopant behavior of group II and VI elements implanted in silicon

✍ Scribed by O. Meyer; N.G.E. Johansson; S.T. Picraux; J.W. Mayer


Publisher
Elsevier Science
Year
1970
Tongue
English
Weight
224 KB
Volume
8
Category
Article
ISSN
0038-1098

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