𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Epitaxial growth of silicon by photochemical vapor deposition at a very low temperature of 200 °C

✍ Scribed by Nishida, Shoji; Shiimoto, Tsunenori; Yamada, Akira; Karasawa, Shiro; Konagai, Makoto; Takahashi, Kiyoshi


Book ID
121669096
Publisher
American Institute of Physics
Year
1986
Tongue
English
Weight
440 KB
Volume
49
Category
Article
ISSN
0003-6951

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES