Size control of silicon nanocrystals in silicon nitride film deposited by catalytic chemical vapor deposition at a low temperature (⩽200 °C)

✍ Scribed by Kyoung-Min Lee; Tae-Hwan Kim; Jae-Dam Hwang; Seunghun Jang; Kiyoung Jeong; Moonsup Han; Sunghwan Won; Junghyun Sok; Kyoungwan Park; Wan-Shick Hong

• Book ID: 113897737
• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 227 KB
• Volume: 60
• Category: Article
• ISSN: 1359-6462
• DOI: 10.1016/j.scriptamat.2008.12.054