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Energy-band alignment of HfO2/SiO2/SiC gate dielectric stack

✍ Scribed by Mahapatra, R.; Chakraborty, Amit K.; Horsfall, A. B.; Wright, N. G.; Beamson, G.; Coleman, Karl S.

Book ID: 118749725
Publisher: American Institute of Physics
Year: 2008
Tongue: English
Weight: 727 KB
Volume: 92
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.2839314

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