๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Energetics of Ge nucleation on SiO2 and implications for selective epitaxial growth

โœ Scribed by Darin Leonhardt; Sang M. Han


Book ID
108280791
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
468 KB
Volume
603
Category
Article
ISSN
0039-6028

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Preparation of nanometer-scale windows i
โœ J.W.H. Maes; P.W. Lukey; T. Zijlstra; C. Visser; J. Caro; E.W.J.M. van der Drift ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 295 KB

Three methods are presented for preparation of windows in SiO 2 for selective epitaxial growth of Si based devices. The window patterns are defined using e-beam lithography and the structures are grown with chemical vapour deposition or molecular beam epitaxy. One method is based on wet etching; the