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Electron mobility models for 4H, 6H, and 3C SiC [MESFETs]

✍ Scribed by Roschke, M.; Schwierz, F.


Book ID
114538741
Publisher
IEEE
Year
2001
Tongue
English
Weight
130 KB
Volume
48
Category
Article
ISSN
0018-9383

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## Abstract This article describes growth and characterization of the highest quality reproducible 3C‐SiC heteroepitaxial films ever reported. By properly nucleating 3C‐SiC growth on top of perfectly on‐axis (0001) 4H‐SiC mesa surfaces completely free of atomic scale steps and extended defects, gro