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Electron beam writing and direct processing system for nanolithography

✍ Scribed by H. Hiroshima; S. Okayama; M. Ogura; M. Komuro; H. Nakazawa; Y. Nakagawa; K. Ohi; K. Tanaka

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 724 KB
Volume: 363
Category: Article
ISSN: 0168-9002
DOI: 10.1016/0168-9002(95)00151-4

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