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Electron-beam-induced activity of defects in silicon

✍ Scribed by P.R. Wilshaw; T.S. Fell; C.A. Amaku; M.D. de Coteau


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
691 KB
Volume
24
Category
Article
ISSN
0921-5107

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✦ Synopsis


The results are presented from an investigation using the electron-beam-induced current (EBIC) and deep-level transient spectroscopy techniques which demonstrate that irradiation with a low energy electron beam produces increased electrical activity in p-type silicon specimens containing Fe or Cu. This effect is termed electron-beam-induced activity (EBIA). An analysis of the EBIC technique for studying transition metal impurities is given and the EBIA of Fe-contaminated silicon is shown to be due to recombination-enhanced dissociation of FeB pairs. Substantial gettering of Fe to the specimen surface is found to occur, even at 300 K, when prolonged irradiation is used. EBIA in copper-contaminated material is found to be due to a state H(0.22) but the physical configuration of this species is not determined.


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