𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Electron beam exposure of diazoquinone based resists

✍ Scribed by Wolfgang A. Kräuter; Humbert M. Noll


Book ID
103598065
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
343 KB
Volume
9
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Ion beam exposure of resists
✍ H. Ryssel; G. Prinke; H. Bernt; K. Haberger; K. Hoffmann 📂 Article 📅 1982 🏛 Springer 🌐 English ⚖ 232 KB
Electron beam resists based on oxirane f
✍ J.J. Murphy; R.G. Jones; G. Cordina 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 266 KB

Copolymers consisting of styrene and 4-ethenyl-phenyloxirane (epoxystyrene) can be synthesised by radical copolymerisation. The flexibility offered by this simple method of synthesis allows the production of a variety of copolymers. The possibility of altering the lithographic parameters by modifica