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Electron Beam Direct Writing technology for LSI prototyping business

✍ Scribed by Yasuhide Machida; Takashi Maruyama; Yoshinori Kojima; Shinji Sugatani; Haruo Tsuchikawa; Kozo Ogino; Hiromi Hoshino


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
370 KB
Volume
87
Category
Article
ISSN
0167-9317

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## Ab~ra~ A new software tool for the support of cell projection in combination with variable shape electron beam lithography for mask making and direct write application is described. The program has been designed and developed for the WePrint 200, a new variable shape electron beam lithography s