✦ LIBER ✦

Electrical reliability of ultra thin remote plasma deposited oxides on silicon

✍ Scribed by L.-Å. Ragnarsson; P. Lundgren; A. Jauhiainen

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Growth kinetics and electrical character

✍ M. Depas; B. Vermeire; P.W. Mertens; M.M. Heyns 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 275 KB

Reliability study of ultra-thin gate oxi

✍ John B. Varzgar; Mehdi Kanoun; Suresh Uppal; Sanatan Chattopadhyay; Yuk Lun Tsan 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 345 KB

Effects of r.f. power on optical and ele

✍ J.L. Andújar; J. Kasaneva; J. Serra; A. Canillas; C. Roch; J.L. Morenza; E. Bert 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 390 KB

Low temperature remote plasma-enhanced d

✍ H.J. Frenck; E. Oesterschulze; R. Beckmann; W. Kulisch; R. Kassing 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 503 KB

Reactivity of organosilicon precursors i

✍ A. M. Wrobel; A. Walkiewicz-Pietrzykowska; I. Blaszczyk-Lezak 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 472 KB 👁 2 views

The effect of deposition rate on the ele

✍ A Wolkenberg 📂 Article 📅 1967 🏛 Elsevier Science 🌐 English ⚖ 191 KB