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Electrical properties of quaternary HfAlTiO thin films grown by atomic layer deposition

✍ Scribed by A.P. Alekhin; A.A. Chouprik; I.P. Grigal; S.A. Gudkova; Yu.Yu. Lebedinskii; A.M. Markeev; S.A. Zaitsev

No coin nor oath required. For personal study only.

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