✦ LIBER ✦

Electrical and structural properties of indium tin oxide films deposited by reactive DC sputtering

✍ Scribed by Rottmann, M; Heckner, K -H

Book ID: 126827537
Publisher: Institute of Physics
Year: 1995
Tongue: English
Weight: 525 KB
Volume: 28
Category: Article
ISSN: 0022-3727
DOI: 10.1088/0022-3727/28/7/024

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Electrical and Structural Properties of

Electrical and Structural Properties of Tin-Doped Indium Oxide Films Deposited by DC Sputtering at Room Temperature

✍ Song, Pung Keun; Shigesato, Yuzo; Kamei, Masayuki; Yasui, Itaru 📂 Article 📅 1999 🏛 Institute of Pure and Applied Physics 🌐 English ⚖ 184 KB

Electrical and optical properties of ind

Electrical and optical properties of indium tin oxide thin films deposited on unheated substrates by d.c. reactive sputtering

✍ T. Karasawa; Y. Miyata 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 441 KB

Electrical properties of vacuum-deposite

Electrical properties of vacuum-deposited indium oxide and indium tin oxide films

✍ Mamoru Mizuhashi 📂 Article 📅 1980 🏛 Elsevier Science 🌐 English ⚖ 818 KB

Structural and Electrical Properties of

Structural and Electrical Properties of Titanium-Doped Indium Oxide Films Deposited by RF Sputtering

✍ Chaoumead, Accarat; Park, Hee-Dae; Joo, Bong-Hyun; Kwak, Dong-Joo; Park, Min-Woo 📂 Article 📅 2013 🏛 Elsevier ⚖ 879 KB

Structure and Internal Stress of Tin-Dop

Structure and Internal Stress of Tin-Doped Indium Oxide and Indium–Zinc Oxide Films Deposited by DC Magnetron Sputtering

✍ Nishimura, Eriko; Sasabayashi, Tomoko; Ito, Norihiro; Sato, Yasushi; Utsumi, Ken 📂 Article 📅 2007 🏛 Institute of Pure and Applied Physics 🌐 English ⚖ 379 KB

Structural and chemical characterization

Structural and chemical characterization of as-deposited microcrystalline indium oxide films prepared by dc reactive magnetron sputtering

✍ C. Xirouchaki; K. Moschovis; E. Chatzitheodoridis; G. Kiriakidis; H. Boye; P. Mo 📂 Article 📅 1999 🏛 Springer US 🌐 English ⚖ 799 KB