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Structural and Electrical Properties of Titanium-Doped Indium Oxide Films Deposited by RF Sputtering

✍ Scribed by Chaoumead, Accarat; Park, Hee-Dae; Joo, Bong-Hyun; Kwak, Dong-Joo; Park, Min-Woo; Sung, Youl-Moon

No coin nor oath required. For personal study only.

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