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Effects of solid phase crystallization by rapid thermal annealing on the optical constants of sputtered amorphous silicon films

✍ Scribed by Amin, Mohammad Shyiq; Hozhabri, Nader; Magnusson, Robert

Book ID
122640622
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
964 KB
Volume
545
Category
Article
ISSN
0040-6090

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## Abstract We study the influence of high‐temperature annealing (1100–1200 Β°C) on the crystallization of nitrogen‐doped silicon films deposited by LPCVD (low‐pressure chemical vapor deposition) at low temperature (465 Β°C) from disilane Si~2~H~6~ and ammonia NH~3~. Scanning electron microscopy (SEM