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Crystallized Si films by low-temperature rapid thermal annealing of amorphous silicon

✍ Scribed by Kakkad, R.; Smith, J.; Lau, W. S.; Fonash, S. J.; Kerns, R.


Book ID
120063904
Publisher
American Institute of Physics
Year
1989
Tongue
English
Weight
713 KB
Volume
65
Category
Article
ISSN
0021-8979

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