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Comparison of properties of solid phase epitaxial silicon on sapphire films recrystallized by rapid thermal annealing and furnace annealing

✍ Scribed by Qiyuan Wang; Yude Zan; Jianhua Wang; Yuanhuan Yu


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
278 KB
Volume
29
Category
Article
ISSN
0921-5107

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✍ Tingting Tan; Zhengtang Liu; Hongcheng Lu; Wenting Liu; Hao Tian πŸ“‚ Article πŸ“… 2010 πŸ› Elsevier Science 🌐 English βš– 231 KB

HfO 2 thin films have been deposited on Si substrate by radio frequency reactive magnetron sputtering. The optical and structural properties of HfO 2 thin films in relation to rapid thermal annealing (RTA) temperatures are investigated by spectroscopic ellipsometry (SE), X-ray diffraction (XRD) and